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Liquid Oxygen Plant Nm3/h KDON-500Y/500Y Shielding gas Chilling and Cooling Nitrogen Liquid
Specifications:
Standard Product for Liquid Oxygen Plant KDON-50~500 Series
MODEL CONTENTS | KDON-65Y/500/150Y | KDON-100/500Y/400Y | KDON-320Y/100Y | KDON-200/100 | KDON-400Y/65Y | |
GAN/LIN flow | Nm3/h | 500/150 | 400(Y) | 100(Y) | 100/60 | 65(Y) |
GAN/LIN purity | ppm | ≤5ppmO2 | ≤5ppmO2 | ≤1ppmO2 | ≤10ppmO2 | ≤1ppmO2 |
GOX/LOX flow | Nm3/h | 65(Y) | 100/500 | 320(Y) | 200/230 | 400(Y) |
GOX/LOX purity | ppm | 99.6% O2 | 99.6% O2 | 99.5% O2 | 99.6% O2 | 99.5% |
GAN/LIN pressure | MPa | 0.0007 | 0.16 | 0.2 | 0.018/0.16 | 0.2 |
GOX/LOX pressure | MPa | 0.16 | 0.025/0.16 | 0.15 | 0.025/0.12 | 0.15 |
LAr flow | Nm3/h |
| 17 |
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LAr purity | ppm |
| 99.999% |
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LAr pressure | MPa |
| 0.16 |
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Typical Product: KDON-500Y/500YLiquid Oxygen Plant
Output, purity and pressure
Product | Flow (Nm3/h) | Purity | Pressure MPa(G) |
GAN/LIN | 500(Y) | 2ppmO2 | 0.2 |
GOX/LOX | 500(Y) | ≥99.6%O2 | 0.9 |
Description:
This is a full low pressure process in which the air is purified by MS with low temperature chiller and boosting turbine expansion. One set of low temperature chiller and two expanders are added to supply cold capacity to liquid product.
The air after purified is divided into 3 parts, the air cooled by chiller with temperature of -30℃ flows into main heat exchanger again, and it is divided into 2 parts: one part flows into expander 1 to be expanded, and then flows into plate-fin to be rewarmed, and then flows to the inlet of air compressor; the other part is continuously cooled and throttled in the plate-fin, and then flows to lower column.
With preliminary rectifying in lower column, liquid air and LIN are obtained from bottom and top of lower column separately. Lair, waste LIN and LIN from lower column is subcooled in Lair/LIN subcooler E2, and then fed to upper column to be rectified further. Then LOX with purity of 99.6% is obtained at bottom of upper column. The required output of LOX is withdrawn out of cold box to LOX storage system of client.
LIN with purity of 2ppmO2 withdrawn from bottom of lower column is subcooled in Lair/LIN subcooler, then required output of high purity LIN is withdrawn out of cold box to LIN storage system of client.
Applications:
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